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    2016-6-10 · The titanium nitride thin films were deposited by reactive magnetron sputtering on silicon substrates using a titanium high purity target. The films were deposited in different conditions. Several films were deposited on silicon substrate at room temperature while the others were obtained after the substrate was preheated.

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    2020-1-6 · Furthermore, a model of silicon nitride waveguide with flat dispersion is proposed by finite element method and signal processing with negligible pulse distortion is realized in near-infrared region. 入藏号: WOS:000484753200003 ISSN: 0031-8949 eISSN: 1402

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